APPLICATIONS OF UV-LIGA AND GRAYSCALE LITHOGRAPHY FOR DISPLAY TECHNOLOGIES

Soft UV Nanoimprint Lithography and Its Applications

Large-area nanopatterning technology has demonstrated high potential which can signifi‐ cantly enhance the performance of many devices and products, such as LEDs, solar cells, hard disk drives, laser diodes, display, etc [1]. For example, nano-patterned sapphire substrates (NPSS) and photonic crystals (PhC) have been considered as the most effective approaches to improve the light output effici...

Active Mask Uv Lithography Systme for Mems and Μtas Applications

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino4,Takashi Mineta4, Toru Masuzawa5 1Department of Mechanical Engineering, Osaka University, Suita, Osaka, Japan 2 Department of Production Systems Engineering, Toyohashi University of Technology, Toyohashi, Japan 3Department of Electrical and Electronic Engineering, Toyohashi University of Toyohashi, Japan Department of Intellige...

UV-LIGA: From Development to Commercialization

A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited...

Manufacturing tolerances for UV LIGA using SU-8 resist

Abstract UV LIGA involves the exposure of SU-8 negative resist, using a UV mask aligner, to produce high aspect ratio pillars or microchannels as part of the manufacturing process for microsystems. This has been made possible by the widespread use of a UV sensitive resist SU-8. Many papers have been written on the Fresnel diffraction theory of exposure, some key properties of SU-8 and prototype...

Advanced Lithography: Nanoimprint Lithography for Semiconductor and Interconnect Technologies